P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates StdPbc-0426 2 Standardized dimensional requirements are

2  Standardized dimensional requirements are provided for a large number of categories of standardized polished wafers as listed in the tables in § 6

SEMI D67 — Test Methods for Antifouling Property and Chemical Resistance of FPD Polarizing Films and its Materials

Consistent preform quality enhances moldability and finished product reliability

The edges of circular wafers of electronic materials are frequently required to be shaped after cutting the wafers from the ingot

NOTICE: This Document was completely rewritten in 2015

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates StdPbc-0426 2 Standardized dimensional requirements areNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements of the glass substrate for hard surface photomasks. This Document covers square photomasks up to 7 inches in length.